Web Reference: Figure 16 shows the rules to be followed in CMOS well processes to accommodate both n and p transistors. Figure 16: CMOS design rules. In this process all the spacing between each layers and dimensions will be in terms micrometer. The 2^m here represents the feature size. 3D fabrication process simulator with cross sectional viewer. Step-by-step 3-D visualization of fabrication for any portion of layout. Lambda-based rules: Allow first order scaling by linearizing the resolution of the complete wafer implementation. To move a design from 4 micron to 2 micron, simply reduce the value of lambda.
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